April 21, 2008 10:00 am

to

April 22, 2008 5:00 pm

Visit us in booth 1132-1134 to learn about our advanced sources, custom systems, and SiN:H deposition equipment for silicon solar cells. General Plasma is developing a new, “disruptive” PECVD source technology initially targetted at the SiN:H market. Solar cell makers and others that need SiN:H coating systems capable of high deposition rates and long intervals between maintenance will want to hear about this. We look forward to seeing you in Chicago.