General Plasma Strengthens its Advanced Sources Division With Acquisition Of The Ion Source Product Line From Advanced Energy Industries; General Plasma Is Now the World Leader In Anode Layer Ion Sources and Technology.

Tucson, Arizona, June 13, 2008 - General Plasma Inc. (GPI) today announced the completion of its acquisition of the Ion Source product line from Advanced Energy Industries, Inc. (Nasdaq: AEIS), based in Fort Collins, Colorado.

“The integration of Advanced Energy’s linear ion sources product line into GPI’s Advanced Sources division secures GPI’s position as the world leader in anode layer ion source technology,” said John Madocks, President and Founder of General Plasma.

“This new product line will allow GPI’s Advanced Sources division to meet a wider set of customer needs and presents significant opportunities for growth into new markets, particularly in the rapidly growing solar energy segment.”

“General Plasma extends its hallmark customer support to Advanced Energy’s ion source customers, offering application support and process development services. GPI’s experience applying our patented ion sources to substrate etching, cleaning, treatment and deposition processes will assist the ion source customer base,” Madocks said.

For additional information on this new product line, click here.

For a copy of the full press release, click here.