| September 1, 2008 | to | September 5, 2008 |
General Plasma will be exhibiting at the 23rd European Photovoltaic Solar Energy Conference & Exhibition in Valencia.
In addition to our exhibition booth, GPI will also be presenting 2 technical papers on our innovative PECVD technology.
Come visit us at the Feria Valencia at booth 3/B 28 to to learn more about our newly announced PECVD Silicon Nitride deposition system for wafer based solar cells. The highlights of this system include: 2ms carrier lifetime, excellent coating uniformity and long production runs. Please click here for additional information. In addition to this exciting new product, GPI will also be presenting product information from our Advanced Sources Group – showing a variety of ion sources, high target utilization rotatable and moving magnet planar magnetrons.
