GPI / Products / Ion Sources

Highly efficient linear ion sources for etching and cleaning, adhesion enhancement and DLC deposition.

The following ion source product options available:

Classic Linear Ion Source (LIS)

  • New product line!
  • Available from 380mm to 3700 mm
  • Versatile - Cleaning, etching, surface modification, ion beam assisted deposition
  • Flange and remote mounts available

Multi/Single Cell Ion Source (MCIS/SCIS)

  • New product line!
  • Gridless Hall current type ion source
  • Typical applications - cleaning and surface treatmet
  • MCIS can also be used for DLC deposition

ALS (Anode Layer Ion Source)

  • Low-cost, yet full featured ion source
  • Simplified installation, minimal vacuum connections
  • Maximum length 500mm
  • Available in annular and linear styles

PPALS™ (Pointed Pole Anode Layer Ion Source)

  • High dynamic etch rate (60 nm m/min)
  • 10x reduction in contamination
  • Easy retrofit for existing anode layer ion sources from all manufacturers
  • 3+ meters long