http://generalplasma.com/2008/08/20/technical-presentations-at-23rd-eu-pvsec/ General Plasma Inc. is a leader in large area thin film technology. Thu, 21 Aug 2008 00:09:06 -0400 http://wordpress.org/?v=2.8.4 hourly 1 http://generalplasma.com/2008/08/20/technical-presentations-at-23rd-eu-pvsec/comment-page-1/#comment-5 Chemical Engineering » Blog Archive » Technical Presentations at 23rd EU PVSEC Thu, 21 Aug 2008 00:09:06 +0000 http://generalplasma.com/?p=302#comment-5 [...] Technorati Search for: chemical wrote an interesting post today onHere’s a quick excerptSeptember 1, 2008toSeptember 4, 2008 General Plasma will give two presentations about our exciting Large Area PECVD Technology at the 23rd EU PVSEC in Valencia, Spain. The first presentation, titled “Silicon Nitride ARC Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology”, highlights the benefits of GPI’s PECVD system for Silicon Nitride deposition. The second presentation is titled “Recent Development of Low Temperature Plasma Enhanced CVD of Transparent Conductive O [...] [...] Technorati Search for: chemical wrote an interesting post today onHere’s a quick excerptSeptember 1, 2008toSeptember 4, 2008 General Plasma will give two presentations about our exciting Large Area PECVD Technology at the 23rd EU PVSEC in Valencia, Spain. The first presentation, titled “Silicon Nitride ARC Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology”, highlights the benefits of GPI’s PECVD system for Silicon Nitride deposition. The second presentation is titled “Recent Development of Low Temperature Plasma Enhanced CVD of Transparent Conductive O [...]

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