December 1^st, 2008 – The Arizona Research Institute for Solar Energy (AzRISE) has asked Company President, John Madocks, to serve on their External Advisory Board. AzRISE is a global institute created at the University of Arizona with academic and industrial partners to foster, support and coordinate collaborative efforts between academia, industry, business, national laboratories, local governments and the public through research and development, economic and public policy analysis, and education at all levels. For further information, visit www.azrise.org

Dr. Mark George, GPI Director of Research, shared his expertise on the status of sputtering, CVD and their roles in solar photovoltaics in the November 2008 issue of Solar Industry. Click on the magazine cover to read the featured article.

General Plasma’s preliminary exhibition and conference calendar is now available here.

Please check back with us as we add to this schedule through out the year.

General Plasma’s recently launched PECVD based Silicon Nitride production system was featured in the September 2008 issue of Photon International.  Click on the magazine cover to read the preview article.

A reminder that Dr. Mark George and Dr. Haripin Chandra will be at the AVS 55th Symposium & Exposition in Boston from Oct 19-24.  They will be presenting two technical papers:

• “Latest Innovations in Large Area Web Coating Technology via PECVD Source Technology” on Thursday October 23rd, 3pm under program number TH-ThA4
• “Recent Development of Low Temperature Plasma Enhanced CVD of Transparent Conducting Oxide in Photovoltaic Applications” on Thursday, October 23rd, 5pm under program number TF-ThA10

For more information, please refer to the earlier post.

General Plasma’s custom thin film coaters are featured in the launch issue of PV International.  One of GPI’s roll-to-roll coaters can been seen in Figure 2 in the linked article.

Dr. Mark George (Director of Research) will be at the Solar Power 2009 show on October 15th.  If you have any questions about our products or technologies, especially our revolutinary Large Area PECVD solutions for Silicon Nitride or low temperature TCOs, please contact us and we will try our best to set up a meeting for you.

General Plasma has joined the prestigious SEMI association - the global industry association serving the supply chain for the microelectronic, display and photovoltaic industries.

Access to the latest information, highest levels of international standards and public policies will allow GPI to continue delivering the best possible products to our valued customers.

Dr. Mark George (Direct of Research) and Dr. Haripin Chandra (Materials Scientist) will be giving technical presentations at the AVS 55th International Symposium & Exhibition in Boston, MA.

Mark will be presenting a paper titled “Latest Innovations in Large Area Web Coating Technology via PECVD Source Technology” on Thursday October 23rd, 3pm under program number TH-ThA4.

Haripin will be presenting a paper titled “Recent Development of Low Temperature Plasma Enhanced CVD of Transparent Conducting Oxide in Photovoltaic Applications” on Thursday, October 23rd, 5pm under program number TF-ThA10.

Both Mark and Haripin will be at the conference from Oct 19th (Sunday) to 25th
(Friday).  If you have any questions about General Plasma or any of
our products and technology, please do not hesitate to contact us and we can setup an appointment for you.

The AVS International Symposium & Exhibition is held at the Hynes Convention Center in Boston, click here for additional information.

Thank you very much to all of you how visited our stand at the EU PVSEC in Valencia.  Both the exhibition and the conference were a great success.

Visitors were particularly impressed with our technical presenations:

• Silicon Nitide Presentation: The excellent carrier lifetimes (over 2ms) of the PECVD Silicon Nitride treated wafers (achieved through silicon passivation and AR coating) proved to be an excellent attetion grabber for industry experts.

• Low Temperature TCO Presentation: The ability to deposit a great TCO layer (2.18E-3 Ohm-cm) at 130 degrees Celsius piqued the interest of many industry leaders - the unlimited possibilities of plastic thin film PV and associated energy savings were on everyone’s minds after that presentation.

For additional information on these presentations, please go to our Large Area PECVD Solutions page, or download the technical papers here (SiN, TCO).

We hope we were able to provide you with some valuable information about GPI’s products and technologies.  If you still have any questions, please do not hesitate to contact us.

Thanks again and we are looking forward to seeing you again very soon.