GPI / News & Events


New GPI site launched!

Posted on May 8th, 2008 | Tags: ,

General Plasma, Inc. is proud to announce the launch of its newly redesigned website, dedicated to provide information about General Plasma’s expanding list of vacuum thin film deposition products and systems, including: ion sources for etching and cleaning, magnetrons for sputtering, custom systems or complete turnkey large area PECVD solutions.

The site will be continually updated with new products, technological breakthroughs and industry events. General Plasma is committed to providing cutting edge technology, educating customers and delivering solutions for their thin film coating needs. If you have any questions or comments, please do not hesitate to contact us via the contact form.




Dr. Mark George invited for poster presentation at IEEE PV Specialists Convention

Posted on May 7th, 2008 | Tags: , ,
May 11, 2008 9:00 amtoMay 15, 2008 9:00 am

Dr. Mark George, General Plasma’s Director of Technology has been selected to give a poster presentation at the 33rd IEEE Photovoltaics Specialists Conference in San Diego. The presentation, titled “Silicon Nitride ARC Thin Films, by New Plasma Enhanced Chemical Vapor Deposition Source Technology”, will be displayed in the Randall Ballroom in the Manchester Grand Hyatt Hotel in San Diego.

For more information about the conference, please click here.




Thin Film Development Laboratory Complete!

Posted on May 6th, 2008 | Tags:

General Plasma’s new thin film development laboratory has been completed! New development capabilities include, three development thin film process tools, two class 100 clean rooms, continuous alarm monitoring gas bunkers, gas scrubber. Thin film characterization equipment has also been upgraded to include a phase shift microscope, Hall mobility analyzer, four point probe, UV-VIS-IS spectrometer, taber abrader and optical microscope. For more information, please click here.




Prototype rotatable magnetron magnet packs shipped

Posted on April 29th, 2008 | Tags:

Magnet packs prototypes were shipped to a customers for evaluation today.




GPI Conference Schedule for 2008

Posted on March 27th, 2008 | Tags:

General Plasma will be at the following conferences and trade shows:




April 21-22: GPI at SVC TechCon in Chicago

Posted on March 27th, 2008 | Tags:
April 21, 2008 10:00 amtoApril 22, 2008 5:00 pm

Visit us in booth 1132-1134 to learn about our advanced sources, custom systems, and SiN:H deposition equipment for silicon solar cells. General Plasma is developing a new, “disruptive” PECVD source technology initially targetted at the SiN:H market. Solar cell makers and others that need SiN:H coating systems capable of high deposition rates and long intervals between maintenance will want to hear about this. We look forward to seeing you in Chicago.




SiN:H Coating by New PECVD Source

Posted on March 26th, 2008 | Tags: , , ,
April 23, 2008
11:30 am

John Madocks, CEO and Dr. Mark George, Director of Technology, will present an important paper on silicon nitride deposition for solar cells at the SVC Techcon in Chicago. Their talk, “Hydrogenated SiN for Anti-Reflection and Passivation of Crystalline Silicon Solar Cells by New PECVD Source” is scheduled for Wednesday morning at 11:30 am in room CT-7. This new process, developed by GPI, is far more efficient than conventional processes and sets a new standard for efficiency and mean time between maintenance.




John Madocks to Speak on Solar Energy at AZRISE

Posted on March 26th, 2008 | Tags: ,

The Arizona Research Institute for Solar Energy (AZRISE) has invited John Madocks, CEO of GPI, to talk about the role of vacuum coating technology in solar energy. In his talk, scheduled for April 19th in Tucson, Madocks will explain how vacuum coating technology enables the fabrication of crystalline silicon and thin-film solar cells. AZRISE is affiliated with the University of Arizona and is dedicated to promoting solar energy in Arizona.




GPI to Introduce New SiN:H Process at Euro PV Conference, September 2008

Posted on March 11th, 2008 | Tags: , ,

In September, General Plasma will introduce a new process for SiNx anti-reflection coating at the European PV Solar Energy Conference in Valencia, Spain. Based on General Plasma’s patented technology, this new disruptive process delivers order-of-magnitude improvements in deposition rate, electricity consumption, cost effectiveness and MTBM cycles.




General Plasma in the Arizona Daily Star

Posted on October 17th, 2007 | Tags:

General Plasma makes the cover of the Arizona Daily Star business section! http://www.azstarnet.com/business/206684.php