GPI / Products

ADVANCED SOURCES FOR SPUTTERING AND ETCHING APPLICATIONS

General Plasma Magnetrons offer unmatched uniformity, reliability and resource utilization.

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General Plasma Ion Sources deliver high etch rates, easy installation and 10x reduction in

contamination.

  • PPALS™ – Industrial ion sources with etch rates up to 20nm-m/min

PPALS

LARGE AREA PECVD SOLUTIONS

General Plasma’s revolutionary PECVD technologies provide high quality large area thin film coatings at a low cost.

  • High deposition rates – 10x reactive sputtering rates
  • Optical quality uniformity
  • Metal oxide and nitride films
  • Complete turnkey solutions with process

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