Highly efficient linear ion sources for etching and cleaning, adhesion enhancement and DLC deposition.

The following ion source product options available:

Classic Linear Ion Source (LIS)

• New product line!
• Available from 380mm to 3700 mm
• Versatile - Cleaning, etching, surface modification, ion beam assisted deposition
• Flange and remote mounts available

PPALS™ (Pointed Pole Anode Layer Ion Source)

• High dynamic etch rate (60 nm m/min)
• 10x reduction in contamination
• Easy retrofit for existing anode layer ion sources from all manufacturers
• 3+ meters long