GPI / Products / Ion Sources

Highly efficient linear ion sources for etching, cleaning, and adhesion enhancement.

The following ion source product options are available:

PPALS™ (Pointed Pole Anode Layer Ion Source)

PPALS - 2.1.2010

  • Patented shaped magnetic field improvement
  • High dynamic etch rate (20 nm m/min)
  • 10x reduction in contamination
  • Easy retrofit for existing anode layer ion sources from all manufacturers
  • 3+ meters long

Classic Linear Ion Source (LIS)

  • Available from 380mm to 3700 mm
  • Versatile – Cleaning, etching, surface modification, ion beam assisted deposition
  • Flange and remote mounts available