Highly efficient linear ion sources for etching and cleaning, adhesion enhancement and DLC deposition.

The following ion source product options available:

Classic Linear Ion Source (LIS)

• New product line!
• Available from 380mm to 3700 mm
• Versatile - Cleaning, etching, surface modification, ion beam assisted deposition
• Flange and remote mounts available

Multi/Single Cell Ion Source (MCIS/SCIS)

• New product line!
• Gridless Hall current type ion source
• Typical applications - cleaning and surface treatmet
• MCIS can also be used for DLC deposition

ALS (Anode Layer Ion Source)

• Low-cost, yet full featured ion source
• Simplified installation, minimal vacuum connections
• Maximum length 500mm
• Available in annular and linear styles

PPALS^TM (Pointed Pole Anode Layer Ion Source)

• High dynamic etch rate (60 nm m/min)
• 10x reduction in contamination
• Easy retrofit for existing anode layer ion sources from all manufacturers
• 3+ meters long