High Performance Industrial Ion Source

The PPALS™ ion source is an ideal source for installations in which etch rate and low contamination play important roles in process performance. The patented pointed pole design optimizes the electron optics in the racetrack resulting in a >2X improvement in etch rate over existing technologies. The same feature also virtually eliminates contamination by pole sputtering.

• Patented Advancement
• 10x Reduction in Contamination
• High Dynamic Etch Rate
• Industrial, High Power Design
• Competitively Priced