Target materials for sputtering magnetrons can be very expensive. General Plasma’s Rotatable Magnetrons and Moving Magnet Planar Magnetrons are engineered to achieve high target utilization, while maintaining excellent film properties and deposition uniformity.

Moving Magnet Planar Magnetron (MMPM)

• >60% target utilization
• Excellent deposited film properties
• Compact design enables direct retrofit of existing planar magnetrons (3+ meters)

Rotatable Magnetron

• >80% target utilization
• High power and high deposition rates
• Custom sizes and lengths (3+ meters)