As a critical component of the thin film deposition process, magnetron sputter technology has become invaluable in modern manufacturing. This high tech approach to creating quality thin film coatings uses magnets to control the activity of high energy plasma. By this process, nanometer thin layers can be efficiently applied to substrates in a wide variety of applications ranging from flat panel displays to potato chip bags.

Recognizing that target materials for sputtering magnetrons are a significant manufacturing cost, General Plasma has uniquely engineered a magnetron product line to achieve high target utilization while maintaining excellent film properties and deposition uniformity.

With over 75% target utilization, our Rotatable Magnetrons deliver low materials cost and high performance. With multiple end block configurations, GPI’s Rotatable Magnetrons are adaptable to existing process machinery and provide outstanding performance.

The General Plasma Moving Magnet Planar Magnetron has a very low cost of ownership driven by reduced material costs and minimized downtime. Less frequent target replacements and low maintenance requirements allow for extended production runs while the compact form factor and scalable design allows for easy retrofit into existing tools.

Moving Magnet Planar Magnetrons (Mov-Mag)™

• Increased target utilization
• Excellent deposited film properties
• Compact design enables direct retrofit of existing planar magnetrons (3+ meters)

Rotary Magnetrons

• 3 end block configurations available: Compact End Block, External End Block, Standard End Block
• No lip seals
• Ferro fluid vacuum seal