General Plasma has updated its selection of product literature to provide you with the most complete information about our expanding product line.
Advanced sources:
Large Area PECVD solutions:
Please continue to check back with General Plasma as we continue to expand our product literature selection.
General Plasma Strengthens its Advanced Sources Division With Acquisition Of The Ion Source Product Line From Advanced Energy Industries; General Plasma Is Now the World Leader In Anode Layer Ion Sources and Technology.
Tucson, Arizona, June 13, 2008 - General Plasma Inc. (GPI) today announced the completion of its acquisition of the Ion Source product line from Advanced Energy Industries, Inc. (Nasdaq: AEIS), based in Fort Collins, Colorado.
“The integration of Advanced Energy’s linear ion sources product line into GPI’s Advanced Sources division secures GPI’s position as the world leader in anode layer ion source technology,” said John Madocks, President and Founder of General Plasma.
“This new product line will allow GPI’s Advanced Sources division to meet a wider set of customer needs and presents significant opportunities for growth into new markets, particularly in the rapidly growing solar energy segment.”
“General Plasma extends its hallmark customer support to Advanced Energy’s ion source customers, offering application support and process development services. GPI’s experience applying our patented ion sources to substrate etching, cleaning, treatment and deposition processes will assist the ion source customer base,” Madocks said.
For additional information on this new product line, click here.
For a copy of the full press release, click here.
| April 23, 2008 | ||
| 11:30 am |
John Madocks, CEO and Dr. Mark George, Director of Technology, will present an important paper on silicon nitride deposition for solar cells at the SVC Techcon in Chicago. Their talk, “Hydrogenated SiN for Anti-Reflection and Passivation of Crystalline Silicon Solar Cells by New PECVD Source” is scheduled for Wednesday morning at 11:30 am in room CT-7. This new process, developed by GPI, is far more efficient than conventional processes and sets a new standard for efficiency and mean time between maintenance.
In September, General Plasma will introduce a new process for SiNx anti-reflection coating at the European PV Solar Energy Conference in Valencia, Spain. Based on General Plasma’s patented technology, this new disruptive process delivers order-of-magnitude improvements in deposition rate, electricity consumption, cost effectiveness and MTBM cycles.