Dr. Mark George (Direct of Research) and Dr. Haripin Chandra (Materials Scientist) will be giving technical presentations at the AVS 55th International Symposium & Exhibition in Boston, MA.

Mark will be presenting a paper titled “Latest Innovations in Large Area Web Coating Technology via PECVD Source Technology” on Thursday October 23rd, 3pm under program number TH-ThA4.

Haripin will be presenting a paper titled “Recent Development of Low Temperature Plasma Enhanced CVD of Transparent Conducting Oxide in Photovoltaic Applications” on Thursday, October 23rd, 5pm under program number TF-ThA10.

Both Mark and Haripin will be at the conference from Oct 19th (Sunday) to 25th
(Friday).  If you have any questions about General Plasma or any of
our products and technology, please do not hesitate to contact us and we can setup an appointment for you.

The AVS International Symposium & Exhibition is held at the Hynes Convention Center in Boston, click here for additional information.

John Madocks (President) will be presenting a technical paper on at AIMCAL Fall Technical Conference 2008 and the 22nd International Vacuum Web Coating Conference.  John will give a technical presentation titled “Recent Development of Low Temperature PECVD of Transparent Conducting Oxide” on Tuesday, October 21st at 0930.

John will be at the conference from Oct 19th (Sunday) to 22nd (Wednesday).  If you have any questions about General Plasma or any of our products, please do not hesitate to contact us and we can setup an appointment for you.

The AIMCAL Fall Technical Conference is held at the Myrtle Beach Marriot Resort at Grande Dunes, click here for additional information.

General Plasma will give two presentations about our exciting Large Area PECVD Technology at the 23rd EU PVSEC in Valencia, Spain.

The first presentation, titled “Silicon Nitride ARC Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology”, highlights the benefits of GPI’s PECVD system for Silicon Nitride deposition.

The second presentation is titled “Recent Development of Low Temperature Plasma Enhanced CVD of Transparent Conductive Oxide in Photovoltaic Applications”, discusses GPI’s current efforts to produce a more economical TCO layer for the manufacture of PV cells.

In addition to these exciting presentations, General Plasma will also have an exhibition stand at the Feria Valencia. Come visit us at booth number 3/B 28 for additional information about our Large Area PECVD advancements and Advanced Source Products!