A reminder that Dr. Mark George and Dr. Haripin Chandra will be at the AVS 55th Symposium & Exposition in Boston from Oct 19-24.  They will be presenting two technical papers:

• “Latest Innovations in Large Area Web Coating Technology via PECVD Source Technology” on Thursday October 23rd, 3pm under program number TH-ThA4
• “Recent Development of Low Temperature Plasma Enhanced CVD of Transparent Conducting Oxide in Photovoltaic Applications” on Thursday, October 23rd, 5pm under program number TF-ThA10

For more information, please refer to the earlier post.

Dr. Mark George (Director of Research) will be at the Solar Power 2009 show on October 15th.  If you have any questions about our products or technologies, especially our revolutinary Large Area PECVD solutions for Silicon Nitride or low temperature TCOs, please contact us and we will try our best to set up a meeting for you.

Dr. Mark George (Direct of Research) and Dr. Haripin Chandra (Materials Scientist) will be giving technical presentations at the AVS 55th International Symposium & Exhibition in Boston, MA.

Mark will be presenting a paper titled “Latest Innovations in Large Area Web Coating Technology via PECVD Source Technology” on Thursday October 23rd, 3pm under program number TH-ThA4.

Haripin will be presenting a paper titled “Recent Development of Low Temperature Plasma Enhanced CVD of Transparent Conducting Oxide in Photovoltaic Applications” on Thursday, October 23rd, 5pm under program number TF-ThA10.

Both Mark and Haripin will be at the conference from Oct 19th (Sunday) to 25th
(Friday).  If you have any questions about General Plasma or any of
our products and technology, please do not hesitate to contact us and we can setup an appointment for you.

The AVS International Symposium & Exhibition is held at the Hynes Convention Center in Boston, click here for additional information.

Thank you very much to all of you how visited our stand at the EU PVSEC in Valencia.  Both the exhibition and the conference were a great success.

Visitors were particularly impressed with our technical presenations:

• Silicon Nitide Presentation: The excellent carrier lifetimes (over 2ms) of the PECVD Silicon Nitride treated wafers (achieved through silicon passivation and AR coating) proved to be an excellent attetion grabber for industry experts.

• Low Temperature TCO Presentation: The ability to deposit a great TCO layer (2.18E-3 Ohm-cm) at 130 degrees Celsius piqued the interest of many industry leaders – the unlimited possibilities of plastic thin film PV and associated energy savings were on everyone’s minds after that presentation.

For additional information on these presentations, please go to our Large Area PECVD Solutions page, or download the technical papers here (SiN, TCO).

We hope we were able to provide you with some valuable information about GPI’s products and technologies.  If you still have any questions, please do not hesitate to contact us.

Thanks again and we are looking forward to seeing you again very soon.

John Madocks (President) will be presenting a technical paper on at AIMCAL Fall Technical Conference 2008 and the 22nd International Vacuum Web Coating Conference.  John will give a technical presentation titled “Recent Development of Low Temperature PECVD of Transparent Conducting Oxide” on Tuesday, October 21st at 0930.

John will be at the conference from Oct 19th (Sunday) to 22nd (Wednesday).  If you have any questions about General Plasma or any of our products, please do not hesitate to contact us and we can setup an appointment for you.

The AIMCAL Fall Technical Conference is held at the Myrtle Beach Marriot Resort at Grande Dunes, click here for additional information.

General Plasma will give two presentations about our exciting Large Area PECVD Technology at the 23rd EU PVSEC in Valencia, Spain.

The first presentation, titled “Silicon Nitride ARC Thin Films by New Plasma Enhanced Chemical Vapor Deposition Source Technology”, highlights the benefits of GPI’s PECVD system for Silicon Nitride deposition.

The second presentation is titled “Recent Development of Low Temperature Plasma Enhanced CVD of Transparent Conductive Oxide in Photovoltaic Applications”, discusses GPI’s current efforts to produce a more economical TCO layer for the manufacture of PV cells.

In addition to these exciting presentations, General Plasma will also have an exhibition stand at the Feria Valencia. Come visit us at booth number 3/B 28 for additional information about our Large Area PECVD advancements and Advanced Source Products!

General Plasma will be exhibiting at the 23rd European Photovoltaic Solar Energy Conference & Exhibition in Valencia.

In addition to our exhibition booth, GPI will also be presenting 2 technical papers on our innovative PECVD technology.

Come visit us at the Feria Valencia at booth 3/B 28 to to learn more about our newly announced PECVD Silicon Nitride deposition system for wafer based solar cells. The highlights of this system include: 2ms carrier lifetime, excellent coating uniformity and long production runs. Please click here for additional information. In addition to this exciting new product, GPI will also be presenting product information from our Advanced Sources Group – showing a variety of ion sources, high target utilization rotatable and moving magnet planar magnetrons.

John Madocks (President), and other GPI team members, will be at SPIE: Solar Enegy + Applications 2008 in San Diego between August 11-14.  They will be discussing GPI’s breakthrough SiN thin film solution for crystaline and polycrystaline solar cells with other industry leaders.  If you have any questions about any of our technologies, please let us know and we will try to schedule a meeting to help answer these questions for you.

Thank you very much to all of you who visited the General Plasma booth at the Semicon West/Intersolar exhibition.  The show was a great success.

We hope we were able to provide you with some valuable information about GPI’s products and technologies.  If you still have any questions, please do not hesitate to contact us.

Thanks again and we are looking forward to seeing you again very soon.

Visit us at booth 9051 at the PV at Semicon West / Intersolar North America exhibition to learn more about our newly announced PECVD Silicon Nitride deposition system for wafer based solar cells. The highlights of this system include: 2ms carrier lifetime, excellent coating uniformity and long production runs. Please click here for additional information. In addition to this exciting new product, GPI will also be presenting product information from our Advanced Sources Group – showing a variety of ion sources, high target utilization rotatable and moving magnet planar magnetrons.

General Plasma’s booth is located on the third floor of Moscone West, booth number 9051.

We look forward to seeing you in San Francisco!