| June 12, 2008 | to | June 14, 2008 |
John Madocks (President), and Dr. Patrick Marcus (Electrical Engineering Manager), will be at Intersolar 2008 in Munich from June 12-14. They will be announcing GPI’s breakthrough SiN thin film solution for crystaline and polycrystaline solar cells.
| May 11, 2008 9:00 am | to | May 15, 2008 9:00 am |
Dr. Mark George, General Plasma’s Director of Technology has been selected to give a poster presentation at the 33rd IEEE Photovoltaics Specialists Conference in San Diego. The presentation, titled “Silicon Nitride ARC Thin Films, by New Plasma Enhanced Chemical Vapor Deposition Source Technology”, will be displayed in the Randall Ballroom in the Manchester Grand Hyatt Hotel in San Diego.
For more information about the conference, please click here.
General Plasma will be at the following conferences and trade shows:
| April 21, 2008 10:00 am | to | April 22, 2008 5:00 pm |
Visit us in booth 1132-1134 to learn about our advanced sources, custom systems, and SiN:H deposition equipment for silicon solar cells. General Plasma is developing a new, “disruptive” PECVD source technology initially targetted at the SiN:H market. Solar cell makers and others that need SiN:H coating systems capable of high deposition rates and long intervals between maintenance will want to hear about this. We look forward to seeing you in Chicago.
| April 23, 2008 | ||
| 11:30 am |
John Madocks, CEO and Dr. Mark George, Director of Technology, will present an important paper on silicon nitride deposition for solar cells at the SVC Techcon in Chicago. Their talk, “Hydrogenated SiN for Anti-Reflection and Passivation of Crystalline Silicon Solar Cells by New PECVD Source” is scheduled for Wednesday morning at 11:30 am in room CT-7. This new process, developed by GPI, is far more efficient than conventional processes and sets a new standard for efficiency and mean time between maintenance.
In September, General Plasma will introduce a new process for SiNx anti-reflection coating at the European PV Solar Energy Conference in Valencia, Spain. Based on General Plasma’s patented technology, this new disruptive process delivers order-of-magnitude improvements in deposition rate, electricity consumption, cost effectiveness and MTBM cycles.